Sci-Tron resists provide routes to new device architectures based on unique and unparalleled etch selectivity, combined with ease of use, allowing industry to develop innovative products and new applications.
Offering bespoke resist development, Sci-Tron work with end-users to combine the high performance of Sci-Tron technology with customers’ existing processes to design new resists to enable fabrication of unique devices.
A paradigm shift in etch performance, Sci-Tron resists are based on a novel modular design where the strength of the underlying chemistry allows variation of each component and performance optimisation.
Innovate UK ‘Smart Grant’ Award for Sci-Tron
Sci-Tron Limited is delighted to have been awarded over £450,000 funding from Innovate UK for further development of its advanced resist technology.
nEBL3 Selective e-Beam Resist with High Etch Selectivity
Sci-Tron Limited have announced the launch of nEBL3, a versatile negative tone e-beam resist with unprecedented etch selectivity that is set to out-perform the market leading alternatives.
Sci-Tron Ltd collaborates with National Graphene Institute
Sci-Tron Ltd continue to collaborate with the National Graphene Institute (NGI) to evaluate their novel resist materials for electron beam lithography.
Sci-Tron awarded InnovateUK ‘Emerging and Enabling Technologies’ Grant
Sci-Tron Ltd have been successful in receiving an award of 500k GBP from InnovateUK to enable the growth and development of the company.