Dr Scott Lewis
Director & Senior Technical Advisor, Sci-Tron Limited.
An early career researcher with a background in studies of lithographic resists: he is the inventor of the nano-composite resist material known as SML, a resist widely used in research laboratories.
With extensive expertise in modelling resist materials and nano-fabrication by photo and e-beam lithography, Scott’s research focuses on developing new materials that will enable fabrication of 5 nm structures, an objective that will enable the electronics industry to create the next generation nanoscale electronic devices that underpin modern society.
Scott holds the prestigious position of visiting associate researcher at the Kavli Nanoscience Institute at the California Institute of Technology.
With many connections in the worldwide semiconductor industry, Scott and the Sci-Tron team are developing resists which can be can be exploited by the electronics industry for the development of next generation technologies.