Sci-Ton Limited, the UK-based creators of advanced metal-organic resists which enable improved performance e-beam lithographic and photolithographic fabrication of nanoscale features, are delighted to announce the addition of Guy DeRose as a consultant and technical advisor.
A highly regarded and world-renowned authority on electron beam lithography systems, Guy is the Associate Director of Technical Operations in the Kavli Nanoscience Institute (KNI) at the California Institute of Technology (Caltech), a position he has held since the laboratory opened in 2008.
He helped establish the Laboratory for Large-Scale Integration of Nanostructures (LSI-Nano), which subsequently evolved into the KNI and has been involved with the organisation since its creation.
Prior to his role in the KNI, he managed a research laboratory in electrical engineering and applied physics and joined Caltech in 1994 as the instructor for the Physics, Mathematics and Astronomy (PMA) Division’s Advanced Physics Labs.
Scott Lewis is Director & Senior Technical Advisor at Sci-Tron Limited and has worked extensively with Guy DeRose at the Kavli Nanoscience Institute for the past 11 years on numerous peer-reviewed research projects on next generation electron beam resists for the production of EUVL photomasks and the use of supramolecular assemblies as lithographic resists.
“We are absolutely delighted to have Guy involved with Sci-Tron at this exciting time for the company. Albeit in an informal advisory capacity thus far, his technical input in the development of our product portfolio of advanced resists has been instrumental.”
“Having Guy’s involvement in the future will help further refine our existing resist families and support our bespoke foundry offering to commercial end-users.”
Guy remarked, “Being involved in an advisory role with Sci-Tron is something that I have wanted to do since I first saw the potential in these new classes of resists. I see this field being on the cusp of some very significant breakthroughs, and the Sci-Tron team is well-positioned to be a major force in those advancements.”