Innovate UK ‘Smart Grant’ Award for Sci-Tron
Sci-Tron Limited is delighted to have been awarded over £450,000 funding from Innovate UK for further development of its advanced resist technology.
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nEBL3 Selective e-Beam Resist with High Etch Selectivity
Sci-Tron Limited have announced the launch of nEBL3, a versatile negative tone e-beam resist with unprecedented etch selectivity that is set to out-perform the market leading alternatives.
Sci-Tron Ltd collaborates with National Graphene Institute
Sci-Tron Ltd continue to collaborate with the National Graphene Institute (NGI) to evaluate their novel resist materials for electron beam lithography.
Sci-Tron awarded InnovateUK ‘Emerging and Enabling Technologies’ Grant
Sci-Tron Ltd have been successful in receiving an award of 500k GBP from InnovateUK to enable the growth and development of the company.
KNI Collaborators win Awards at 2018 SPIE Photomask Technology Conference
Longtime KNI collaborator Dr. Scott Lewis receives award for his talk on ‘Design and implementation of the next-generation electron-beam resists for the production of EUVL photomasks’
Sci-Tron Director Awarded ERC Advanced Grant
Professor Richard Winpenny, one of the three founding Directors of Sci-Tron Limited, has been award an Advanced Grant by the European Research Council for his project ‘Heterometallic Rings for Future Electronics’ (HERIFUEL).
Sci-Tron Ltd Win at RSC Emerging Technologies Competition
University spin-out, Sci-Tron Ltd, fought off stiff competition to win first prize in the Materials category at the Royal Society of Chemistry’s annual Emerging Technologies Competition 2016.
Sci-Tron Ltd Incorporated
Sci-Tron Ltd aims to offer a new approach to advanced resist materials to enable continued scaling of semiconductor device sizes and performance.