Sci-Tron Limited have announced the launch of nEBL3, a versatile negative tone e-beam resist with unprecedented etch selectivity that is set to out-perform the market leading alternatives.
Sci-Tron Ltd continue to collaborate with the National Graphene Institute (NGI) to evaluate their novel resist materials for electron beam lithography.
Sci-Tron Ltd have been successful in receiving an award of 500k GBP from InnovateUK to enable the growth and development of the company.
Longtime KNI collaborator Dr. Scott Lewis receives award for his talk on ‘Design and implementation of the next-generation electron-beam resists for the production of EUVL photomasks’
University spin-out, Sci-Tron Ltd, fought off stiff competition to win first prize in the Materials category at the Royal Society of Chemistry’s annual Emerging Technologies Competition 2016.