Category Archives: Nanotechnology

Jun12020

nEBL3 Selective e-Beam Resist with High Etch Selectivity

Advanced Resists, Nanotechnology, News

Sci-Tron Limited have announced the launch of nEBL3, a versatile negative tone e-beam resist with unprecedented etch selectivity that is set to out-perform the market leading alternatives.

NEWS and ARTICLES

Innovate UK ‘Smart Grant’ Award for Sci-Tron
November 27, 2020
nEBL3 Selective e-Beam Resist with High Etch Selectivity
June 1, 2020
Sci-Tron Ltd collaborates with National Graphene Institute
March 6, 2020
Sci-Tron awarded InnovateUK ‘Emerging and Enabling Technologies’ Grant
October 6, 2018
KNI Collaborators win Awards at 2018 SPIE Photomask Technology Conference
September 29, 2018

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Sci-Tron Limited.

Department of Chemistry
University of Manchester
Oxford Road
Manchester M13 9PL
UK

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info@sci-tron.com

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